Course Syllabus

SAC LogoComputer Flat Pattern Design Syllabus

Course Description:  Computerized apparel pattern drafting, size grading, and marking are taught using Tuka Tech software as tools. Prior to enrollment, student must be able to manually draft patterns, grade patterns, and layout markers.

Textbook Information:  Armstrong, H.. Patternmaking for Fashion Design, 5th ed. Prentice Hall, 2010, ISBN: 13-1699



Student Learning Objectives:  Students will be able to draft a basic block pattern using computer drafting software.

Meet Your Instructor: 

Kyla Benson is the Department Chair of the Fashion Program at Santa Ana College. She has recently revamped SAC's fashion program with her industry connections from her tenure as a designer in L.A.'s and Orange County's apparel industry. Kyla has designed for large companies including Hurley, O'Neill, and Fox Racing. She has also started small businesses where her work has been seen in magazines including InStyle and US Weekly and worn by celebrities such as Drew Barrymore and Alicia Keys' baby son. You can review her past experiences on Linked In


Course Syllabus:  FDM 216 Syllabus.pdf

 

Course Summary:

Date Details Due